Gu Y Z, Zhang W F, Gu D H, Gan F X
Opt Lett. 2001 Nov 15;26(22):1788-90. doi: 10.1364/ol.26.001788.
SrBi(2)Ta(2)O(9) (SBT) thin films on quartz substrates were prepared by use of the pulsed-laser deposition technique. The nonlinear refractive indices, n(2) , of the SBT films were measured by use of z-scan techniques with picosecond pulses. Large negative nonlinear refractive indices of 3.84 and 3.58cm(2)/GW were obtained for the wavelengths 532 nm and 1.064mum , respectively. The two-photon absorption coefficient was determined to be 7.3 cm/GW for 532 nm. The limiting behavior of SBT thin film on a quartz substrate was investigated in an f/5 defocusing geometry by use of 38-ps-duration, 532-nm, 1.064mum laser excitation.
采用脉冲激光沉积技术在石英衬底上制备了SrBi(2)Ta(2)O(9)(SBT)薄膜。利用皮秒脉冲的z扫描技术测量了SBT薄膜的非线性折射率n(2)。对于波长532nm和1.064μm,分别获得了3.84和3.58cm(2)/GW的大的负非线性折射率。对于532nm,双光子吸收系数确定为7.3cm/GW。利用脉宽为38ps、波长为532nm和1.064μm的激光激发,在f/5散焦几何结构中研究了石英衬底上SBT薄膜的限幅行为。