Science. 1977 Mar 18;195(4283):1230-5. doi: 10.1126/science.195.4283.1230.
Although the limitations of the methods of lithography in use at a particular time are easily recognized and attract substantial attention, experience shows that technological ingenuity keeps pushing them to ever-smaller dimensions. There seems to be no fundamental reason to expect that lithographic limits will not continue to recede. The limits to the advance of miniaturization are to be found in the ability of materials to withstand high electric fields and in the ability of packaging technology to remove heat from active components and provide for power distribution, signal interconnection, and flexible mechanical assembly.
虽然在特定时期使用的光刻方法的局限性很容易被识别出来,并引起广泛关注,但经验表明,技术的创造力不断推动着它们向更小的尺寸发展。似乎没有根本的理由预计光刻技术的限制不会继续缩小。小型化的限制在于材料承受高电场的能力以及封装技术从有源元件中散热并提供功率分配、信号互连和灵活机械组装的能力。