Science. 1990 May 18;248(4957):838-40. doi: 10.1126/science.248.4957.838.
The various products from the reaction of chlorine (Cl) with the adatom layer of the Si(111)-(7x7) surface have been identified with scanning tunneling microscopy (STM). Initially, a single Cl atom reacts with the adatom dangling bond. At higher surface coverage, additional Cl atoms insert themselves into the Si-Si backbonds between the adatom and rest-atom layers, producing adatoms that have reacted with two or three Cl atoms. These products are characterized by different registries with respect to the underlying rest layer and appear in STM images as adatoms of different sizes, consistent with the breaking of Si-Si backbonds and the formation ofnew Si-Cl bonds.
用扫描隧道显微镜(STM)鉴定了氯(Cl)与 Si(111)-(7x7)表面的吸附原子层反应的各种产物。最初,一个 Cl 原子与悬空键的吸附原子反应。在更高的表面覆盖率下,额外的 Cl 原子插入吸附原子层和剩余原子层之间的 Si-Si 背键中,产生与两个或三个 Cl 原子反应的吸附原子。这些产物在相对于底层剩余层的不同登记处被表征,并且在 STM 图像中作为不同尺寸的吸附原子出现,这与 Si-Si 背键的断裂和新的 Si-Cl 键的形成一致。