Gao Tingjuan, Rothberg Lewis J
Department of Chemistry, University of Rochester, Rochester, New York 14627, USA.
Anal Chem. 2007 Oct 15;79(20):7589-95. doi: 10.1021/ac071082d. Epub 2007 Sep 11.
We report an interferometric method to detect chemical binding at an interface. The interference layer consists of the thin native oxide on silicon, and we utilize nearly opposite phase shifts of light at the oxide/water and oxide/silicon interfaces to achieve near-complete destructive interference. We measure selective binding of thrombin in solution to DNA aptamers covalently bound to the oxide. The technique can be used to detect and quantify surface binding of less than 1 A of material, sensitivity similar to that of surface plasmon resonance imaging or arrayed imaging reflectometry. Results are in quantitative agreement with what is predicted theoretically. The method is very convenient to implement since it utilizes unmodified silicon wafers as substrates and is extremely insensitive to both probe light bandwidth and collimation.
我们报告了一种用于检测界面处化学结合的干涉测量方法。干涉层由硅上的薄原生氧化物组成,并且我们利用光在氧化物/水和氧化物/硅界面处几乎相反的相移来实现近乎完全的相消干涉。我们测量了溶液中的凝血酶与共价结合在氧化物上的DNA适配体的选择性结合。该技术可用于检测和量化小于1埃材料的表面结合,其灵敏度与表面等离子体共振成像或阵列成像反射测量法相似。结果与理论预测在定量上一致。该方法实施起来非常方便,因为它使用未改性的硅片作为基底,并且对探测光带宽和准直都极其不敏感。