Liu Bin, He Yaning, Fan Pengwei, Wang Xiaogong
Department of Chemical Engineering, Laboratory for Advanced Materials, Tsinghua University, Beijing, 100084, P. R. China.
Langmuir. 2007 Oct 23;23(22):11266-72. doi: 10.1021/la7016402. Epub 2007 Sep 20.
In this work, azo polymer microspherical cap arrays possessing unique photoprocessible properties have been fabricated through a soft-lithographic contact printing approach. In the process, hexagonal polystyrene (PS) colloidal arrays, obtained by the vertical deposition method, were used as masters. Poly(dimethylsiloxane) (PDMS) stamps with aligned hemisphere air voids on the surfaces were obtained by casting the precursor against the colloidal arrays. By using the stamps and a solution of an epoxy-based azo polymer (BP-AZ-CA) as "ink", the microspherical cap arrays were fabricated by pressing the "inked" surfaces against substrates. Uniform 2D arrays of the submicrometer spherical caps could be obtained on the substrates after peeling off the stamps and drying. The characteristic sizes of the arrays depended on some adjustable features, such as the diameters of PS spheres and concentrations of the "inks" used in the process. After exposure to a linearly polarized Ar+ laser single beam, the spherical caps could be stretched along the polarization direction, and the arrays were consequently transformed into ellipsoidal cap arrays. Upon irradiation of interfering p-polarized Ar+ laser beams, only the spherical caps in the bright fringes were deformed by the light irradiation, which resulted in more complicated surface relief patterns. The observation gives another well-defined example of the photoinduced mass migration in the submicrometer scale. The approach can potentially be applied to fabrication of microlens arrays with different converging rate in two directions.
在这项工作中,通过软光刻接触印刷方法制备了具有独特光加工性能的偶氮聚合物微球帽阵列。在此过程中,采用垂直沉积法获得的六边形聚苯乙烯(PS)胶体阵列作为母版。通过将前驱体浇铸在胶体阵列上,得到表面具有排列整齐的半球形气隙的聚二甲基硅氧烷(PDMS)印章。利用该印章和基于环氧树脂的偶氮聚合物(BP-AZ-CA)溶液作为“墨水”,通过将“蘸墨”表面压在基板上来制备微球帽阵列。在揭下印章并干燥后,可在基板上获得均匀的亚微米级球形帽二维阵列。阵列的特征尺寸取决于一些可调节的因素,如PS球的直径和该过程中使用的“墨水”浓度。在受到线偏振Ar+激光单束照射后,球形帽可沿偏振方向拉伸,阵列因此转变为椭球形帽阵列。在干涉的p偏振Ar+激光束照射下,只有亮条纹中的球形帽因光照射而变形,从而产生更复杂的表面起伏图案。该观察结果给出了亚微米尺度下光致质量迁移的另一个明确实例。该方法有可能应用于制备在两个方向上具有不同会聚率的微透镜阵列。