Liu Bin, Wang Mingqing, He Yaning, Wang Xiaogong
Department of Chemical Engineering, Laboratory for Advanced Materials, Tsinghua University, Beijing 100084, P. R. China.
Langmuir. 2006 Aug 15;22(17):7405-10. doi: 10.1021/la061178n.
In this work, a soft lithographic approach has been developed to duplicate photoinduced surface-relief-gratings (SRGs) of azo polymer films to generate the surface pattern replicas composed of different materials on various substrates. For this purpose, thin films of an epoxy-based azo polymer (BP-AZ-CA) were prepared by spin-coating, and SRGs with different structures were inscribed by exposing the films to interference patterns of Ar(+) laser beams at modest intensity (150 mW/cm(2)). Using the azo polymer films as masters, stamps of poly(dimethylsiloxane) (PDMS) were prepared by replica molding. The PDMS stamps were then used to transfer the solutions of poly(3-hexylthiophene) (P3HT), multiwalled carbon nanotube (MWNT), and BP-AZ-CA to different substrates by contact printing. Through this process, surface pattern replicas made of the functional materials were obtained. The pattern formation and quality depended on the factors such as the solution concentration, contacting time in the printing process, and printing pressure. Under the proper conditions, the printed patterns showed the same grating periods as the masters and the same relief depths as the stamps (replicas of the masters). This approach, showing some attractive characteristics such as the easiness of master preparation and the versatility of soft fabrication processes, can be applied to the fabrications of optical functional surfaces, sensors, and photonic devices.
在这项工作中，已开发出一种软光刻方法，用于复制偶氮聚合物薄膜的光致表面浮雕光栅（SRG），以在各种基板上生成由不同材料组成的表面图案复制品。为此，通过旋涂制备了基于环氧树脂的偶氮聚合物（BP-AZ-CA）薄膜，并通过将薄膜暴露于适度强度（150 mW/cm²）的Ar(+)激光束干涉图案中来刻写具有不同结构的SRG。以偶氮聚合物薄膜为母版，通过复制模塑制备聚二甲基硅氧烷（PDMS）印章。然后使用PDMS印章通过接触印刷将聚（3-己基噻吩）（P3HT）、多壁碳纳米管（MWNT）和BP-AZ-CA的溶液转移到不同的基板上。通过这个过程，获得了由功能材料制成的表面图案复制品。图案的形成和质量取决于溶液浓度、印刷过程中的接触时间和印刷压力等因素。在适当的条件下，印刷图案显示出与母版相同的光栅周期和与印章（母版的复制品）相同的浮雕深度。这种方法具有一些吸引人的特点，如母版制备容易和软制造工艺的通用性，可应用于光学功能表面、传感器和光子器件的制造。
