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[近紫外光照射期间NADH敏化DNA断裂形成的机制]

[Mechanism of NADH-sensitized formation of DNA breaks during irradiation with near UV light].

作者信息

Burchuladze T G, Fraĭkin G Ia

出版信息

Mol Biol (Mosk). 1991 Jul-Aug;25(4):955-9.

PMID:1795709
Abstract

NADH-photosensitized in vitro formation of single-stranded breaks in plasmid DNA pBR322 depends on both the concentration of the sensitizer and the influence of near-UV radiation (320-400 nm). Scavengers and inhibitors of different activated oxygen species (sodium azide, sodium benzoate, catalase and superoxide dismutase) prevent the formation of breaks in full or partly. The data obtained show that hydroxyl radical (.OH) and singlet oxygen (1O2) are directly involved in the induction of breaks. In this process hydrogen peroxide (H2O2) plays the role of an intermediate in the reaction of .OH formation from superoxide anion-radical (O2-.) which is the first NAD.H-photogenerated product.

摘要

烟酰胺腺嘌呤二核苷酸(NADH)光致敏在体外使质粒DNA pBR322形成单链断裂,这既取决于敏化剂的浓度,也取决于近紫外辐射(320 - 400纳米)的影响。不同活性氧的清除剂和抑制剂(叠氮化钠、苯甲酸钠、过氧化氢酶和超氧化物歧化酶)可全部或部分阻止断裂的形成。所获得的数据表明,羟基自由基(·OH)和单线态氧(¹O₂)直接参与了断裂的诱导过程。在此过程中,过氧化氢(H₂O₂)在超氧阴离子自由基(O₂⁻·)形成·OH的反应中起中间体的作用,而超氧阴离子自由基是NADH光生成的首个产物。

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