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[近紫外辐射作用下质粒DNA中单链断裂的敏化NADH形成]

[Sensitized NADH formation of single-stranded breaks in plasmid DNA upon the action of near UV-radiation].

作者信息

Burchuladze T G, Sideris E G, Fraĭkin G Ia

出版信息

Biofizika. 1990 Sep-Oct;35(5):722-5.

PMID:2083269
Abstract

It has been shown that NADH photosensitize in vitro single-strand breaks formation in double-strand plasmid DNA pBR 322 upon near-UV (320-400 nm) irradiation. The number of single-strand breaks depends both on UV light dose and sensitizer concentration. Addition of catalase and sodium benzoate strongly decreases the single-strand breaks formation. The results show an important role of hydrogen peroxide (H2O2) and hydroxyl radical (.OH) in inducing single-strand breaks in plasmid DNA irradiated by near-UV radiation in the presence of NADH.

摘要

研究表明,在近紫外光(320 - 400纳米)照射下,烟酰胺腺嘌呤二核苷酸(NADH)可在体外使双链质粒DNA pBR 322形成单链断裂。单链断裂的数量取决于紫外光剂量和敏化剂浓度。添加过氧化氢酶和苯甲酸钠可显著减少单链断裂的形成。结果表明,在NADH存在的情况下,过氧化氢(H2O2)和羟基自由基(·OH)在近紫外辐射诱导质粒DNA单链断裂中起重要作用。

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