Degroote Jessica E, Marino Anne E, Wilson John P, Bishop Amy L, Lambropoulos John C, Jacobs Stephen D
The Institute of Optics, University of Rochester, Wilmot Building, 275 Hutchison Road, Rochester, New York 14627-0186, USA.
Appl Opt. 2007 Nov 10;46(32):7927-41. doi: 10.1364/ao.46.007927.
Magnetorheological finishing (MRF) is a deterministic subaperture polishing process. The process uses a magnetorheological (MR) fluid that consists of micrometer-sized, spherical, magnetic carbonyl iron (CI) particles, nonmagnetic polishing abrasives, water, and stabilizers. Material removal occurs when the CI and nonmagnetic polishing abrasives shear material off the surface being polished. We introduce a new MRF material removal rate model for glass. This model contains terms for the near surface mechanical properties of glass, drag force, polishing abrasive size and concentration, chemical durability of the glass, MR fluid pH, and the glass composition. We introduce quantitative chemical predictors for the first time, to the best of our knowledge, into an MRF removal rate model. We validate individual terms in our model separately and then combine all of the terms to show the whole MRF material removal model compared with experimental data. All of our experimental data were obtained using nanodiamond MR fluids and a set of six optical glasses.
磁流变抛光(MRF)是一种确定性的子孔径抛光工艺。该工艺使用一种磁流变(MR)流体,它由微米级的球形磁性羰基铁(CI)颗粒、非磁性抛光磨料、水和稳定剂组成。当CI和非磁性抛光磨料将材料从被抛光表面剪切下来时,就会发生材料去除。我们介绍了一种新的玻璃磁流变抛光材料去除率模型。该模型包含玻璃近表面力学性能、拖曳力、抛光磨料尺寸和浓度、玻璃化学耐久性、磁流变流体pH值以及玻璃成分等项。据我们所知,我们首次将定量化学预测因子引入磁流变抛光去除率模型。我们分别验证了模型中的各个项,然后将所有项组合起来,展示整个磁流变抛光材料去除模型与实验数据的对比情况。我们所有的实验数据都是使用纳米金刚石磁流变流体和一组六种光学玻璃获得的。