往复式磁流变抛光材料去除模型研究

Study on Material Removal Model by Reciprocating Magnetorheological Polishing.

作者信息

Wang Rensheng, Xiu Shichao, Sun Cong, Li Shanshan, Kong Xiangna

机构信息

School of Mechanical Engineering, Liaoning Institute of Science and Technology, Benxi 117004, China.

School of Mechanical Engineering and Automation, Northeastern University, Shenyang 110819, China.

出版信息

Micromachines (Basel). 2021 Apr 8;12(4):413. doi: 10.3390/mi12040413.

DOI:10.3390/mi12040413

PMID:33917829

原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC8068226/

Abstract

In this study, a new reciprocating magnetorheological polishing (RMRP) method for a flat workpiece was proposed. Based on the RMRP principle and Preston equation, the material removal rate (MRR) model of the RMRP as well as its normal polishing pressure model was established. On this basis, the effects of different technological parameters including workpiece rotation speed, eccentric wheel rotation speed and eccentricity on the MRR of the workpiece were investigated. The K9 optical flat glass was polished with the RMRP setup to verify the MRR model. The experimental results showed that the effect of workpiece rotation speed on the MRR was much greater than that of eccentric wheel rotation speed and eccentricity, and the MRR increased from 0.0115 ± 0.0012 to 0.0443 ± 0.0015 μm/min as workpiece rotation speed rose. The optimum surface roughness reduced to Ra 50.8 ± 1.2 from initial Ra 330.3 ± 1.6 nm when the technical parameters of the workpiece rotation speed of 300 rpm, the eccentric wheel rotation speed of 20 rpm and the eccentricity of 0.02 m were applied. The average relative errors between the theoretical and experimental values were 16.77%, 10.59% and 7.38%, respectively, according to the effects of workpiece rotation speed, eccentric wheel rotation speed and eccentricity on MRR.

摘要

本研究提出了一种用于平面工件的新型往复式磁流变抛光（RMRP）方法。基于RMRP原理和普雷斯顿方程，建立了RMRP的材料去除率（MRR）模型及其法向抛光压力模型。在此基础上，研究了工件转速、偏心轮转速和偏心距等不同工艺参数对工件MRR的影响。采用RMRP装置对K9光学平面玻璃进行抛光，以验证MRR模型。实验结果表明，工件转速对MRR的影响远大于偏心轮转速和偏心距的影响，随着工件转速的升高，MRR从0.0115±0.0012μm/min增加到0.0443±0.0015μm/min。当采用工件转速300rpm、偏心轮转速20rpm、偏心距0.02m的工艺参数时，最佳表面粗糙度从初始的Ra 330.3±1.6nm降低到Ra 50.8±1.2nm。根据工件转速、偏心轮转速和偏心距对MRR的影响，理论值与实验值之间的平均相对误差分别为16.77%、10.59%和7.38%。