Karlsson M, Hjort K, Nikolajeff F
Opt Lett. 2001 Nov 15;26(22):1752-4. doi: 10.1364/ol.26.001752.
The transfer of continuous-relief diffractive structures from resist into diamond by use of direct-write electron-beam lithography followed by dry etching in an inductively coupled plasma is demonstrated. The gases used for the diamond etching are O(2) and Ar. The chemical-vapor-deposited diamond substrate is of optical quality. Our results show that the transfer process generates fairly smooth etched structures. Blazed gratings with periods of 45mum and Fresnel lenses have been manufactured. The blazed gratings have been optically evaluated with a femtosecond laser operating at 400 nm. The diffraction efficiency was 68% in the first order, with a theoretical value of 100%. We intend to investigate the transfer process further and then to fabricate diffractive and refractive elements for use with Nd:YAG high-power lasers.
通过使用直写电子束光刻技术，随后在感应耦合等离子体中进行干法蚀刻，展示了将连续浮雕衍射结构从抗蚀剂转移到金刚石中的过程。用于蚀刻金刚石的气体是O₂和Ar。化学气相沉积的金刚石衬底具有光学质量。我们的结果表明，转移过程产生了相当光滑的蚀刻结构。已经制造出周期为45μm的闪耀光栅和菲涅耳透镜。使用工作在400nm的飞秒激光对闪耀光栅进行了光学评估。一阶衍射效率为68%，理论值为100%。我们打算进一步研究转移过程，然后制造用于Nd:YAG高功率激光器的衍射和折射元件。
