Vernooy D W, Ilchenko V S, Mabuchi H, Streed E W, Kimble H J
Opt Lett. 1998 Feb 15;23(4):247-9. doi: 10.1364/ol.23.000247.
Measurements of the quality factor Q approximately 8x10(9) are reported for the whispering-gallery modes (WGM's) of quartz microspheres for the wavelengths 670, 780, and 850 nm; these results correspond to finesse f approximately 2.2x10(6) . The observed independence of Q from wavelength indicates that losses for the WGM's are dominated by a mechanism other than bulk absorption in fused silica in the near infrared. Data obtained by atomic force microscopy combined with a simple model for surface scattering suggest that Q can be limited by residual surface inhomogeneities. Absorption by absorbed water can also explain why the material limit is not reached at longer wavelengths in the near infrared.
据报道，对于波长为670、780和850 nm的石英微球回音壁模式（WGM），品质因数Q的测量值约为8×10⁹；这些结果对应于精细度f约为2.2×10⁶。观察到的Q与波长的无关性表明，WGM的损耗由近红外熔融石英中的体吸收以外的机制主导。通过原子力显微镜获得的数据与表面散射的简单模型相结合表明，Q可能受到残余表面不均匀性的限制。吸收水的吸收也可以解释为什么在近红外较长波长下未达到材料极限。
