Alley T G, Brueck S R
Center for High Technology Materials and Department of Physics and Astronomy, University of New Mexico, Albuquerque, New Mexico 87106, USA.
Opt Lett. 1998 Aug 1;23(15):1170-2. doi: 10.1364/ol.23.001170.
We etched thermally poled fused-silica coverslips in 49% HF for 30 s transverse to the poling direction to reveal structural details of the nonlinear region. A peaked ridge below the anode surface, corresponding to a slower etch rate than that of the bulk SiO(2) , was located approximately 5 microm below the anode surface for a poling time of 30 s. The ridge moved deeper into the glass logarithmically with poling time. This trend is qualitatively consistent with a recent model for the formation of the space-charge region that includes injection of hydrogen ions at the anode surface.
我们将热极化的熔融石英盖玻片在49%的氢氟酸中垂直于极化方向蚀刻30秒，以揭示非线性区域的结构细节。对于30秒的极化时间，在阳极表面下方约5微米处发现了一个峰值脊，其对应着比块状SiO₂ 更低的蚀刻速率。随着极化时间的增加，该脊以对数方式向玻璃内部更深的位置移动。这种趋势在定性上与最近一个关于空间电荷区域形成的模型一致，该模型包括阳极表面氢离子的注入。
