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用于固态激光锁模的半导体掺杂二氧化硅可饱和吸收体薄膜。

Semiconductor-doped-silica saturable-absorber films for solid-state laser mode locking.

作者信息

Bilinsky I P, Fujimoto J G, Walpole J N, Missaggia L J

出版信息

Opt Lett. 1998 Nov 15;23(22):1766-8. doi: 10.1364/ol.23.001766.

Abstract

We describe a new saturable-absorber materials system for solid-state laser mode locking based on thin, nonepitaxially grown, semiconductor-doped films. We fabricated thin films of InAs semiconductor microcrystalites in silica, using rf sputtering. We could control the linear absorption by varying the film thickness, and the nonlinear absorption saturation cross section and recovery time could be adjusted by use of rapid thermal annealing. The use of 30-nm- thick InAs-doped silica films on sapphire for initiation of Kerr-lens mode locking in a Ti:Al(2)O(3) laser was demonstrated. Pulses as short as 25 fs were generated with a wavelength tuning range from 800 to 880 nm.

摘要

我们描述了一种基于非外延生长的半导体掺杂薄膜的新型固态激光锁模饱和吸收体材料系统。我们使用射频溅射法制备了二氧化硅中铟砷半导体微晶的薄膜。我们可以通过改变薄膜厚度来控制线性吸收,并且可以通过快速热退火来调节非线性吸收饱和截面和恢复时间。展示了在蓝宝石上使用30纳米厚的掺铟砷二氧化硅薄膜在钛宝石激光器中实现克尔透镜锁模。产生了波长调谐范围为800至880纳米、短至25飞秒的脉冲。

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