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掺钒宽禁带半导体碳化硅中的持续光谱烧孔

Persistent spectral-hole burning in the wide-gap semiconductor SiC doped with vanadium.

作者信息

Kummer R, Hecht C, Winnacker A

出版信息

Opt Lett. 1997 Jun 15;22(12):916-8. doi: 10.1364/ol.22.000916.

DOI:10.1364/ol.22.000916
PMID:18185705
Abstract

Persistent spectral-hole burning was performed in the gamma line of V(4+) in the wide-gap semiconductor 6HSiC. Spectral holes burned at 11 K were stable to temperatures of at least 320 K for several days. The hole-burning mechanism consists of two-step photoionization of V(4+) (self-gated spectral-hole burning). The spectral holes could be erased optically, either by pumping of electrons back from stable traps or, presumably, by a charge-transfer transition from the valence band to the V(5+) ions.

摘要

在宽带隙半导体6HSiC中,对V(4+)的γ线进行了持续光谱烧孔实验。在11K下烧出的光谱孔在至少320K的温度下稳定了几天。烧孔机制由V(4+)的两步光电离组成(自门控光谱烧孔)。光谱孔可以通过将电子从稳定陷阱中泵回,或者大概通过从价带到V(5+)离子的电荷转移跃迁,进行光学擦除。

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