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等离子体活化硅衬底上氨基硅烷的气相自组装单分子层

Vapor-phase self-assembled monolayers of aminosilane on plasma-activated silicon substrates.

作者信息

Fiorilli S, Rivolo P, Descrovi E, Ricciardi C, Pasquardini L, Lunelli L, Vanzetti L, Pederzolli C, Onida B, Garrone E

机构信息

Dipartimento di Scienza dei Materiali ed Ingegneria Chimica, Politecnico di Torino, Corso Duca degli Abruzzi 24, I-10129 Torino, Italy.

出版信息

J Colloid Interface Sci. 2008 May 1;321(1):235-41. doi: 10.1016/j.jcis.2007.12.041. Epub 2008 Feb 6.

DOI:10.1016/j.jcis.2007.12.041
PMID:18258249
Abstract

Aminosilane self-assembled monolayers on silicon substrates have been prepared via a gas-phase procedure based on the consecutive reactions of the aminosilane precursor and water vapor. X-ray photoelectron spectroscopy, atomic force microscopy, and contact angle measurements have been used to characterize the aminosilane layers. For comparison, substrates modified with aminosilane through a liquid-phase procedure have been prepared and characterized by means of the same techniques. The vapor-based procedure was found to yield more uniform layers characterized by fewer and smaller aggregates as compared with liquid-treated substrates. Grazing angles reflection Fourier transform infrared measurements were carried out on the vapor-treated substrates before and after water exposure to investigate the hydrolysis of the alkoxy groups and further reaction to form siloxane bonds. The surface density of amino groups, as estimated through a colorimetric method, is very similar for vapor- and liquid-treated substrates, suggesting a similar reactivity and accessibility of the functional groups on the surface.

摘要

通过基于氨基硅烷前驱体与水蒸气的连续反应的气相程序,在硅基底上制备了氨基硅烷自组装单分子层。利用X射线光电子能谱、原子力显微镜和接触角测量对氨基硅烷层进行了表征。为作比较,还制备了通过液相程序用氨基硅烷改性的基底,并采用相同技术对其进行了表征。结果发现,与经液相处理的基底相比,基于气相的程序产生的层更均匀,其特征是聚集体更少且更小。对经气相处理的基底在水暴露前后进行掠角反射傅里叶变换红外测量,以研究烷氧基的水解以及形成硅氧烷键的进一步反应。通过比色法估算,气相处理和液相处理的基底上氨基的表面密度非常相似,这表明表面官能团具有相似的反应活性和可及性。

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