Seely J F, Kowalski M P, Cruddace R G, Heidemann K F, Heinzmann U, Kleineberg U, Osterried K, Menke D, Rife J C, Hunter W R
Appl Opt. 1997 Nov 1;36(31):8206-13. doi: 10.1364/ao.36.008206.
We characterized a laminar grating with a Mo/Si multilayer coating by using synchrotron radiation and atomic force microscopy. The grating substrate had 2400 grooves/mm, 40-A groove depth, and 2080-A groove width. The microroughness of the grating substrate was 5 A rms. The multilayer coating was optimized to have peak normal-incidence reflectance at a wavelength near 150 A. For an angle of incidence of 10 degrees the peak grating efficiency was 16.3% in the +1 order and 15.0% in the -1 order. The efficiency in the zero order was lower by a factor of 40 owing to the excellent matching of the groove depth and groove width to the wavelength of the incident radiation. By dividing the grating efficiencies by the measured reflectance of the multilayer coating, we obtained inferred groove efficiencies of 34% and 32% in the +1 and -1 orders, respectively.
我们通过同步辐射和原子力显微镜对一种带有Mo/Si多层涂层的层状光栅进行了表征。光栅基板具有2400条/毫米的刻槽、40埃的刻槽深度和2080埃的刻槽宽度。光栅基板的微观粗糙度为均方根值5埃。多层涂层经过优化,在波长接近150埃处具有峰值正入射反射率。对于10度的入射角,光栅在+1级的峰值效率为16.3%,在-1级为15.0%。由于刻槽深度和刻槽宽度与入射辐射波长的出色匹配,零级效率降低了40倍。通过将光栅效率除以多层涂层的测量反射率,我们分别得到了+1级和-1级的推断刻槽效率为34%和32%。