Poleshchuk A G, Churin E G, Koronkevich V P, Korolkov V P, Kharissov A A, Cherkashin V V, Kiryanov V P, Kiryanov A V, Kokarev S A, Verhoglyad A G
Laboratory of Laser Technologies, Institute of Automation and Electrometry, Russian Academy of Sciences, Koptuga Prospekt 1, 630090 Novosibirsk, Russia.
Appl Opt. 1999 Mar 10;38(8):1295-301. doi: 10.1364/ao.38.001295.
A precision laser pattern generator for writing arbitrary diffractive elements was developed as an alternative to Cartesian coordinate laser/electron-beam writers. This system allows for the fabrication of concentric continuous-relief and arbitrary binary patterns with minimum feature sizes of less than 0.6 microm and position accuracy of 0.1 microm over 300-mm substrates. Two resistless technologies of writing on chromium and on amorphous silicon films were developed and implemented. We investigated limit characteristics by writing special test structures. A 58-mm f/1.1 zone plate written directly is demonstrated at a lambda/50 rms wave-front error corresponding to a 0.06-microm pattern accuracy. Several examples of fabricated diffractive elements are presented.
开发了一种用于写入任意衍射元件的精密激光图案发生器，作为笛卡尔坐标激光/电子束写入器的替代方案。该系统能够在300毫米的基板上制造同心连续浮雕和任意二元图案，最小特征尺寸小于0.6微米，位置精度为0.1微米。开发并实施了两种在铬膜和非晶硅膜上的无抗蚀剂写入技术。我们通过写入特殊测试结构来研究极限特性。直接写入的58毫米f/1.1波带片在λ/50均方根波前误差下得到了演示，对应于0.06微米的图案精度。给出了几个制造的衍射元件示例。
