Vukusic J, Bengtsson J, Ghisoni M, Larsson A, Carlström C F, Landgren G
Department of Microelectronics, Chalmers and Photonics Laboratory, Microtechnology Center, Chalmers University of Technology, SE-412 96 Göteborg, Sweden.
Appl Opt. 2000 Jan 20;39(3):398-401. doi: 10.1364/ao.39.000398.
We report on the fabrication and subsequent characterization of binary diffractive optical elements (DOE's) in InP for operation at 1.3 microm. Fresnel lenses of different focal lengths and a DOE that splits and focuses an incident beam into a 1 x 4 array of spots (optical fan-out) were fabricated. We realized the surface reliefs by patterning resist, using electron-beam lithography and etching with a chemically assisted ion beam, which produced well-defined patterns with smooth sidewalls and little if no surface roughness. The measured efficiency for the lenses was 36%. For the fan-out element the efficiency and the uniformity error were 26% and 30%, respectively. Spot sizes as small as 16 microm were measured.
我们报告了用于1.3微米波长工作的磷化铟二元衍射光学元件（DOE）的制造及后续特性表征。制造了不同焦距的菲涅耳透镜以及一个将入射光束分裂并聚焦成1×4光斑阵列（光学扇出）的DOE。我们通过光刻胶图案化、使用电子束光刻以及化学辅助离子束蚀刻来实现表面浮雕，从而产生具有清晰图案、光滑侧壁且表面粗糙度极小（若有的话）的图案。所测量的透镜效率为36%。对于扇出元件，效率和均匀性误差分别为26%和30%。测量到的光斑尺寸小至16微米。
