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用于极紫外窄带成像的多层涂层。

Multilayer coatings for narrow-band imaging in the extreme ultraviolet.

作者信息

Larruquert J I, Keski-Kuha R A

出版信息

Appl Opt. 2001 Mar 1;40(7):1126-31. doi: 10.1364/ao.40.001126.

DOI:10.1364/ao.40.001126
PMID:18357097
Abstract

Multilayer coatings for the extreme ultraviolet with high reflectance at a spectral band of interest and zero reflectance at another band to be suppressed have been designed and prepared. Multilayer coatings were designed to maximize normal-incidence reflectance at the O(+) 83.4-nm spectral line and to suppress at the same time radiation at the 121.6-nm hydrogen Lyman alpha line. Fresh Al/MgF(2)/Mo multilayer coatings resulted in high reflection/suppression ratios at the above wavelengths. The coatings also exhibited a dip in reflectance at 102.6-nm Lyman beta. The coatings showed some slow but steady degradation over time that could be partially eliminated by sample cleaning. Al/MgF(2)/Mo multilayer coatings protected with a thin ion-beam-deposited C film were found to give a high reflection/suppression ratio with lower degradation over time.

摘要

已设计并制备了用于极紫外的多层涂层,该涂层在感兴趣的光谱带具有高反射率,而在另一个要抑制的波段具有零反射率。多层涂层的设计目的是使在O(+) 83.4纳米光谱线处的正入射反射率最大化,同时抑制121.6纳米氢莱曼α线处的辐射。新鲜的Al/MgF₂/Mo多层涂层在上述波长下具有高反射/抑制比。这些涂层在102.6纳米莱曼β线处的反射率也有下降。随着时间的推移,涂层显示出一些缓慢但稳定的降解,通过样品清洁可以部分消除这种降解。发现用薄的离子束沉积C膜保护的Al/MgF₂/Mo多层涂层具有高反射/抑制比,且随时间的降解较低。

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