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Allergic photocontact dermatitis due to suprofen. Photopatch testing and cross-reaction study.

作者信息

Kurumaji Y, Ohshiro Y, Miyamoto C, Keong C H, Katoh T, Nishioka K

机构信息

Department of Dermatology, School of Medicine, Tokyo Medical and Dental University, Japan.

出版信息

Contact Dermatitis. 1991 Oct;25(4):218-23. doi: 10.1111/j.1600-0536.1991.tb01848.x.

DOI:10.1111/j.1600-0536.1991.tb01848.x
PMID:1839262
Abstract

We report 5 cases of photocontact dermatitis due to suprofen, a nonsteroidal anti-inflammatory drug introduced to the Japanese market in 1989, and available as a 1% ointment. The patients developed pruritic eczematous lesions after applying the ointment for from 2 weeks to 3 months. All 5 patients reacted positively to photopatch testing with ultraviolet A (UVA) and suprofen down to 0.1-0.01% pet., and 3 patients showed positive reactions with ultraviolet B (UVB) and suprofen down to 1.0-0.1%. Moreover, all patients showed a cross-reaction with tiaprofenic acid, which has a very similar chemical structure to suprofen. However, there was no cross-reaction between suprofen and ketoprofen. Prescribers should be aware of the existence of photocontact sensitivity due to these drugs.

摘要

相似文献

1
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引用本文的文献

1
Crossreactions in contact dermatitis.接触性皮炎中的交叉反应。
Clin Rev Allergy Immunol. 1997 Winter;15(4):477-84. doi: 10.1007/BF02737742.
2
Tiaprofenic acid. A reappraisal of its pharmacological properties and use in the management of rheumatic diseases.噻洛芬酸。对其药理特性及在风湿性疾病治疗中的应用的重新评估。
Drugs. 1995 Dec;50(6):1050-75. doi: 10.2165/00003495-199550060-00010.