Lambert K, Moreels I, Thourhout D Van, Hens Z
Physics and Chemistry of Nanostructures, Ghent University, Krijgslaan 281-S12, B-9000 Ghent, Belgium.
Langmuir. 2008 Jun 3;24(11):5961-6. doi: 10.1021/la703664r. Epub 2008 Apr 29.
Using InP and PbSe quantum dots, we demonstrate that the Langmuir-Blodgett technique is well-suited to coat nonflat surfaces with quantum dot monolayers. This allows deposition on silicon substrates covered by a developed patterned resist, which results in monolayer patterns with micrometer resolution. Atomic force microscopy and scanning electron microscopy reveal the formation of a densely packed monolayer that replicates predefined structures with high selectivity after photoresist removal. A large variety of shapes can be reproduced and, due to the excellent adhesion of the quantum dots to the substrate, the hybrid approach can be repeated on the same substrate. This final possibility leads to complex, large-area quantum dot monolayer structures with micrometer spatial resolution that may combine different types of quantum dots.
使用磷化铟和硒化铅量子点，我们证明了朗缪尔-布洛杰特技术非常适合用量子点单层覆盖非平面表面。这使得能够沉积在覆盖有显影图案化抗蚀剂的硅基板上，从而得到具有微米分辨率的单层图案。原子力显微镜和扫描电子显微镜揭示了在去除光刻胶后形成了紧密堆积的单层，该单层以高选择性复制了预定义的结构。可以复制各种各样的形状，并且由于量子点与基板之间具有出色的附着力，因此可以在同一基板上重复这种混合方法。这种最终的可能性导致形成具有微米空间分辨率的复杂大面积量子点单层结构，该结构可能结合了不同类型的量子点。
