Bischoff Martin, Gäbler Dieter, Kaiser Norbert, Chuvilin Andrey, Kaiser Ute, Tünnermann Andreas
Friedrich-Schiller-University, Institute of Applied Physics, Max-Wien-Platz 1, 07743 Jena, Germany.
Appl Opt. 2008 May 1;47(13):C157-61. doi: 10.1364/ao.47.00c157.
LaF(3) thin films of different thicknesses were deposited on CaF(2) (111) and silicon substrates at a relatively low substrate temperature of 150 degrees C. Optical (transmittance, reflectance, refractive index, and extinction coefficient) and mechanical (morphology and crystalline structure) properties have been investigated and are discussed. It is shown that LaF(3) thin films deposited on CaF(2) (111) substrates are monocrystalline and have a bulklike dense structure. Furthermore, it is presented that low-loss LaF(3) thin films can be deposited not only by boat evaporation but also by electron beam evaporation.
在150摄氏度的相对较低衬底温度下，将不同厚度的LaF(3)薄膜沉积在CaF(2)(111)和硅衬底上。对其光学（透过率、反射率、折射率和消光系数）和机械（形态和晶体结构）性能进行了研究并加以讨论。结果表明，沉积在CaF(2)(111)衬底上的LaF(3)薄膜是单晶的，具有类似块状的致密结构。此外，研究表明低损耗LaF(3)薄膜不仅可以通过舟蒸发法沉积，也可以通过电子束蒸发法沉积。
