Sun Haishan, Chen Antao, Olbricht Benjamin C, Davies Joshua A, Sullivan Philip A, Liao Yi, Shi Zhengwei, Luo Jingdong, Jen Alex K, Dalton Larry R
Department of Electrical Engineering, University of Washington, Seattle, Washington 98195, USA.
Opt Express. 2008 Jun 9;16(12):8472-9. doi: 10.1364/oe.16.008472.
A novel technique for the fabrication of polarization selective electro-optic polymer waveguide devices with direct electron beam writing was described. Birefringence induced by the electric field poling in the electro-optic polymer film was erased in the electron beam exposed regions. The formed waveguides had stronger confinement for the light polarized along the poling direction. High fabrication resolution on the 100 nm scale or smaller could be achieved. Fabrication of polymer polarizer and polarization selective microring resonators with this technique was reported. The highest polarization extinction ratio was measured to be 21.4 dB.
描述了一种利用直接电子束写入制造偏振选择性电光聚合物波导器件的新技术。在电子束曝光区域，电光聚合物薄膜中由电场极化引起的双折射被消除。形成的波导对沿极化方向偏振的光具有更强的限制作用。可以实现100纳米及更小尺度的高制造分辨率。报道了用该技术制造聚合物偏振器和偏振选择性微环谐振器。测得的最高偏振消光比为21.4分贝。
