Mathew Jose V, Chowdhury Abhishek, Bhattacharjee Sudeep
Department of Physics, Indian Institute of Technology, Kanpur, India.
Rev Sci Instrum. 2008 Jun;79(6):063504. doi: 10.1063/1.2943341.
A compact microwave driven plasma ion source for focused ion beam applications has been developed. Several gas species have been experimented including argon, krypton, and hydrogen. The plasma, confined by a minimum B multicusp magnetic field, has good radial and axial uniformity. The octupole multicusp configuration shows a superior performance in terms of plasma density (~1.3 x 10(11) cm(-3)) and electron temperature (7-15 eV) at a power density of 5-10 Wcm(2). Ion current densities ranging from a few hundreds to over 1000 mA/cm(2) have been obtained with different plasma electrode apertures. The ion source will be combined with electrostatic Einzel lenses and should be capable of producing multielemental focused ion beams for nanostructuring and implantations. The initial simulation results for the focused beams have been presented.
