Finley Charles C, Holden Timothy A, Holden Laura K, Whiting Bruce R, Chole Richard A, Neely Gail J, Hullar Timothy E, Skinner Margaret W
Departments of Otolaryngology-Head and Neck Surgery and Biomedical Engineering, University of North Carolina at Chapel Hill, Chapel Hill, North Carolina, USA.
Otol Neurotol. 2008 Oct;29(7):920-8. doi: 10.1097/MAO.0b013e318184f492.
Suboptimal cochlear implant (CI) electrode array placement may reduce presentation of coded information to the central nervous system and, consequently, limit speech recognition.
Generally, mean speech reception scores for CI recipients are similar across different CI systems, yet large outcome variation is observed among recipients implanted with the same device. These observations suggest significant recipient-dependent factors influence speech reception performance. This study examines electrode array insertion depth and scalar placement as recipient-dependent factors affecting outcome.
Scalar location and depth of insertion of intracochlear electrodes were measured in 14 patients implanted with Advanced Bionics electrode arrays and whose word recognition scores varied broadly. Electrode position was measured using computed tomographic images of the cochlea and correlated with stable monosyllabic word recognition scores.
Electrode placement, primarily in terms of depth of insertion and scala tympani versus scala vestibuli location, varies widely across subjects. Lower outcome scores are associated with greater insertion depth and greater number of contacts being located in scala vestibuli. Three patterns of scalar placement are observed suggesting variability in insertion dynamics arising from surgical technique.
A significant portion of variability in word recognition scores across a broad range of performance levels of CI subjects is explained by variability in scalar location and insertion depth of the electrode array. We suggest that this variability in electrode placement can be reduced and average speech reception improved by better selection of cochleostomy sites, revised insertion approaches, and control of insertion depth during surgical placement of the array.
人工耳蜗(CI)电极阵列放置欠佳可能会减少向中枢神经系统传递的编码信息,从而限制言语识别。
一般来说,不同CI系统的CI接受者的平均言语接受分数相似,但在植入同一设备的接受者中观察到较大的结果差异。这些观察结果表明,存在显著的受者相关因素影响言语接受性能。本研究将电极阵列插入深度和蜗管位置作为影响结果的受者相关因素进行研究。
在14例植入Advanced Bionics电极阵列且单词识别分数差异较大的患者中,测量了蜗内电极的蜗管位置和插入深度。使用耳蜗的计算机断层扫描图像测量电极位置,并将其与稳定的单音节单词识别分数相关联。
电极放置,主要是插入深度以及鼓阶与前庭阶位置方面,在不同受试者之间差异很大。较低的结果分数与更大的插入深度以及位于前庭阶的电极触点数量较多有关。观察到三种蜗管放置模式,表明手术技术导致插入动态存在变异性。
CI受试者广泛性能水平范围内单词识别分数的显著差异部分可由电极阵列的蜗管位置和插入深度的变异性来解释。我们建议,通过更好地选择蜗窗位置、改进插入方法以及在阵列手术放置过程中控制插入深度,可以减少电极放置的这种变异性并提高平均言语接受能力。