Kimoto Koji, Ishizuka Kazuo, Matsui Yoshio
National Institute for Materials Science, Ibaraki, Japan.
Micron. 2008 Aug;39(6):653-7. doi: 10.1016/j.micron.2007.09.011.
We demonstrate atomic-column imaging by scanning transmission electron microscopy (STEM) and electron energy-loss spectroscopy (EELS). The silicon atomic-columns of a beta-Si3N4 (0 0 1) specimen are clearly resolved. The atomic-site dependence and the energy-loss dependence of the spatial resolution are elucidated on the basis of the experimental results and multislice calculations. We describe two decisive factors for realizing atomic-column imaging in terms of localization in elastic and inelastic scattering. One is the channeling of the incident probe due to dynamical diffraction, which has atomic-site dependence. The other is the localization in inelastic scattering; in addition to the energy-loss dependence of delocalization, we point out its dependence on the offset energy from the ionization energy, i.e., an additional localization factor concerning the Bethe surface. The present atomic-column observation of the Si-L core-loss image indicates that the local approximation, which can be interpreted intuitively, is achievable under appropriate experimental conditions, such as high-energy-loss, a small convergence angle and a large collection angle (e.g., 400 eV, 15 and 30 mrad, respectively).
我们通过扫描透射电子显微镜(STEM)和电子能量损失谱(EELS)展示了原子列成像。β-Si3N4(0 0 1)样品的硅原子列清晰可辨。基于实验结果和多层计算,阐明了空间分辨率的原子位置依赖性和能量损失依赖性。我们从弹性散射和非弹性散射中的局域化角度描述了实现原子列成像的两个决定性因素。一个是由于动态衍射导致的入射探针的沟道效应,它具有原子位置依赖性。另一个是非弹性散射中的局域化;除了离域化的能量损失依赖性外,我们指出其对离电离能的偏移能量的依赖性,即与贝特表面有关的额外局域化因子。目前对Si-L芯损失图像的原子列观察表明,在适当的实验条件下,如高能量损失、小会聚角和大收集角(例如分别为400 eV、15和30 mrad),可以实现直观解释的局部近似。