Yang Bin, Luca Vittorio
Inst. of Materials Eng., Australian Nuclear Science and Technology Organisation, PMB 1, Menai, NSW 2234, Australia.
Chem Commun (Camb). 2008 Oct 7(37):4454-6. doi: 10.1039/b807629d. Epub 2008 Jul 29.
Tungsten trioxide (WO3) films doped with 0.25 atom% tellurium synthesised by a sol-gel route, show strong transient photocurrents under chopped sub-bandgap illumination (hnu=1.8 eV<Eg) at low bias potentials from 0.2 to 0.7 V; such effects are ascribed to the presence of a localized narrow band (NB) between the VB and the CB in this material.
通过溶胶-凝胶法合成的掺杂0.25原子%碲的三氧化钨(WO₃)薄膜,在0.2至0.7 V的低偏置电位下,于斩波亚带隙光照(hν = 1.8 eV < Eg)下显示出强烈的瞬态光电流;这种效应归因于该材料价带和导带之间存在局部窄带(NB)。