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用于水分解应用的钽掺杂氧化钨薄膜的反应性共溅射沉积

Reactive co-sputter deposition of Ta-doped tungsten oxide thin films for water splitting application.

作者信息

Jafarpour Samaneh, Naghshara Hamid

机构信息

Faculty of Physics, University of Tabriz, Tabriz, Iran.

出版信息

Sci Rep. 2025 Mar 10;15(1):8302. doi: 10.1038/s41598-025-92008-6.

Abstract

This study aimed to investigate the structural, optical, and electronic properties of WO thin films modified by Ta-doping, considering their potential application in photoelectrochemical (PEC) water splitting. Due to its unique physical and chemical properties, WO films have been commonly suggested as a promising photoanode for hydrogen production. However, the wide bandgap and unsuitable band edge positions of WO limit its PEC efficiency. Doping have been extensively applied as an effective strategy for bandgap engineering. Here, post-annealed WO films with different concentrations of Ta dopant were synthesized via reactive magnetron co-sputtering, while DC and RF sputtering powers were varied with the aim of achieving the desired properties. EDX analysis showed that Ta atoms were doped into WO in the range of 0-3.93 at%. As evident from SEM and AFM images, the surface morphology was significantly affected by increasing Ta doping, the formation of a granular structure with well-defined boundaries and increasing surface roughness (1.79-47.94 nm). XRD patterns confirmed that the incorporation of Ta atoms into a monoclinic WO improved the crystallinity, especially in the (002) direction. Most importantly, a decrease in the average transparency (92.82-74.27%), an increase in visible absorption, a red shift of the fundamental absorption edge corresponding to a favorable drop in the optical bandgap energy (3.07-2.61 eV) were found with increasing Ta concentration. Notably, the substitution of W ions with Ta dopant (0-3.93 at%) led to an upward shift in the valence band maximum (3.62-3.31 eV) and a downward shift in the conduction band minimum (0.55-0.70 eV). The WO photoanode doped with 3.93 at% Ta exhibited the maximum photocurrent density of 0.65 mA/cm (at 1 V vs. Ag/AgCl) under simulated sunlight. Furthermore, WO photoanode doped with 3.93 at% Ta showed excellent photoresponsivity and slow electron-hole recombination. The obtained results predict the potential of Ta-doping coupled with post-annealing to optimize the structural and optoelectronic properties of sputtered WO thin films as photoanode for use in efficient PEC water splitting.

摘要

本研究旨在研究钽掺杂改性的WO薄膜的结构、光学和电子性质,考虑其在光电化学(PEC)水分解中的潜在应用。由于其独特的物理和化学性质,WO薄膜通常被认为是一种有前途的用于制氢的光阳极。然而,WO的宽带隙和不合适的带边位置限制了其PEC效率。掺杂已被广泛用作带隙工程的有效策略。在此,通过反应磁控共溅射合成了不同钽掺杂浓度的后退火WO薄膜,同时改变直流和射频溅射功率以实现所需性能。能谱分析表明,钽原子以0 - 3.93原子百分比的范围掺杂到WO中。从扫描电子显微镜(SEM)和原子力显微镜(AFM)图像可以明显看出,随着钽掺杂量的增加,表面形貌受到显著影响,形成了边界清晰的颗粒结构且表面粗糙度增加(1.79 - 47.94纳米)。X射线衍射(XRD)图谱证实,将钽原子掺入单斜晶系的WO中提高了结晶度,特别是在(002)方向上。最重要的是,随着钽浓度的增加,发现平均透明度降低(92.82 - 74.27%)、可见光吸收增加、基本吸收边红移,对应着光学带隙能量的有利下降(3.07 - 2.61电子伏特)。值得注意的是,用钽掺杂剂(0 - 3.93原子百分比)替代钨离子导致价带最大值上移(3.62 - 3.31电子伏特)和导带最小值下移(0.55 - 0.70电子伏特)。掺杂3.93原子百分比钽的WO光阳极在模拟太阳光下表现出最大光电流密度为0.65毫安/平方厘米(相对于Ag/AgCl为1伏)。此外,掺杂3.93原子百分比钽的WO光阳极表现出优异的光响应性和缓慢的电子 - 空穴复合。所获得的结果预示了钽掺杂结合后退火在优化溅射WO薄膜作为用于高效PEC水分解的光阳极的结构和光电性质方面的潜力。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/e171/11893905/0ebd95cf7f55/41598_2025_92008_Fig1_HTML.jpg

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