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193纳米氟化氩激光辐射所致的光性角膜炎

Photokeratitis from 193 nm argon-fluoride laser radiation.

作者信息

Sliney D H, Krueger R R, Trokel S L, Rappaport K D

机构信息

Institute of Ophthalmology, London, UK.

出版信息

Photochem Photobiol. 1991 Jun;53(6):739-44. doi: 10.1111/j.1751-1097.1991.tb09886.x.

DOI:10.1111/j.1751-1097.1991.tb09886.x
PMID:1886933
Abstract

The threshold for photokeratitis at 193 nm was obtained for the rabbit cornea using an ArF excimer laser. Because ablation occurs at a level below that for photokeratitis, it was necessary to expose the cornea to a lengthy series of low-energy exposures. It is concluded that the 193 nm photons have such a shallow penetration depth, being limited to the outermost epithelial cells, that classical photokeratitis occurs from the fluorescence emitted at the corneal epithelial absorption site. An intact tear film may help to protect the cornea from low-level, scattered 193 nm laser radiation.

摘要

使用ArF准分子激光获得了兔角膜在193nm波长下的光性角膜炎阈值。由于消融发生在低于光性角膜炎的水平,因此有必要让角膜接受一系列长时间的低能量照射。得出的结论是,193nm光子的穿透深度很浅,仅限于最外层的上皮细胞,经典的光性角膜炎是由角膜上皮吸收部位发出的荧光引起的。完整的泪膜可能有助于保护角膜免受低水平、散射的193nm激光辐射。

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Br J Ophthalmol. 1993 Nov;77(11):702-8. doi: 10.1136/bjo.77.11.702.