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不同防晒霜中的紫外线过滤剂引起的光变应性接触性皮炎。

Photoallergic contact dermatitis caused by ultraviolet filters in different sunscreens.

作者信息

Collaris Esther J H, Frank Jorge

机构信息

Department of Dermatology, University Medical Center Maastricht, The Netherlands.

出版信息

Int J Dermatol. 2008 Nov;47 Suppl 1:35-7. doi: 10.1111/j.1365-4632.2008.03957.x.

Abstract

Over the last decade, a change in the public awareness regarding the possible danger of excessive sunlight exposure has resulted in an increased consumption of sunscreens. These products contain a broad spectrum of putative sensitizers that can cause contact dermatitis and, upon exposure to ultraviolet (UV) irradiation, photocontact dermatitis. Among these sensitizing compounds, UV filters are the most frequent cause of photoallergic reactions. Although rarely observed, we here describe the occurrence of a photoallergic contact dermatitis in a 55-year-old man after the use of two different sunscreens. Photopatch testing showed hypersensitivity reactions of the delayed type against three different chemical UV filters, 4-tert-butyl-4- methoxy-dibenzoylmethane (Parsol 1789), 2-ethylhexyl-p-methoxycinnamate (Parsol MCX), and isoamyl-p-methoxycinnamate (Neoheliopan).

摘要

在过去十年中,公众对过度暴露于阳光下可能存在的危险的认识发生了变化,导致防晒霜的消费量增加。这些产品含有多种可能引起接触性皮炎的致敏剂,并且在暴露于紫外线(UV)照射下会引起光接触性皮炎。在这些致敏化合物中,紫外线过滤剂是最常见的光过敏反应原因。虽然很少见,但我们在此描述了一名55岁男性在使用两种不同的防晒霜后发生光过敏性接触性皮炎的情况。光斑贴试验显示对三种不同的化学紫外线过滤剂,4-叔丁基-4-甲氧基二苯甲酰甲烷(帕索1789)、2-乙基己基对甲氧基肉桂酸酯(帕索MCX)和异戊基对甲氧基肉桂酸酯(新胡莫司汀)出现迟发型过敏反应。

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