Verri Giovanni, Clementi Catia, Comelli Daniela, Cather Sharon, Piqué Francesca
Courtauld Institute of Art, Somerset House, Strand, London, WC2R 0RN UK.
Appl Spectrosc. 2008 Dec;62(12):1295-302. doi: 10.1366/000370208786822296.
Ultraviolet-induced fluorescence spectroscopy is a commonly used technique for the characterization and identification of painting materials, such as organic binders and colorants. Its interpretation is strictly connected to both the experimental setup and an understanding of the physical and chemical interactions among materials in paint layers, which are commonly composed of a fluorescent organic binder and a pigment. When irradiated with ultraviolet radiation, the light emitted by fluorophores present in the organic binder undergoes several types of interactions, in particular scattering and absorption by neighboring pigmented particles and auto-absorption. As a result of scattering and absorption phenomena, the emission spectrum is deformed according to the physical properties of the surrounding pigmented particles. This can lead to shifts of the emission maxima and/or to the formation of apparent new emission bands. The extent of the modifications to the emission spectra, caused by auto-absorption and selective absorption phenomena, may lead to the erroneous characterization or identification of the fluorescent materials. As a consequence, the interpretation of the emission signal can be greatly compromised. A correction based on the Kubelka-Munk theory is proposed to evaluate the extent of the spectral distortion and is assessed on modern replicas of wall paintings of known composition. Although the model cannot be applied to all cases, qualitative distinctions between real and apparent emissions are achieved.
紫外诱导荧光光谱法是一种常用的用于表征和鉴定绘画材料(如有机粘合剂和着色剂)的技术。其解释与实验装置以及对漆膜中材料间物理和化学相互作用的理解密切相关,漆膜通常由荧光有机粘合剂和颜料组成。当用紫外线照射时,有机粘合剂中存在的荧光团发出的光会经历几种相互作用,特别是被相邻的有色颗粒散射和吸收以及自吸收。由于散射和吸收现象,发射光谱会根据周围有色颗粒的物理性质而变形。这可能导致发射最大值的偏移和/或明显新发射带的形成。由自吸收和选择性吸收现象引起的发射光谱的修改程度可能导致对荧光材料的错误表征或鉴定。因此,发射信号的解释可能会受到很大影响。提出了一种基于库贝尔卡-蒙克理论的校正方法来评估光谱畸变的程度,并在已知成分的壁画现代复制品上进行了评估。尽管该模型不能适用于所有情况,但实现了真实发射和表观发射之间的定性区分。