Contrast-sensitivity loss in a group of former microelectronics workers with normal visual acuity.

The measurement of contrast sensitivity at varying grating frequencies is used increasingly to study visual and neural disorders. It provides more information than conventional acuity measures. Refractive errors initially affect high spatial frequencies, whereas lower spatial frequencies are affected only when these errors are pronounced. Neurophysiological alterations are reflected by depressed sensitivity to coarse gratings. Visual dysfunction has been associated with workplace exposures to a wide range of organic solvents. In microelectronics assembly where large quantities of organic solvents are used in many aspects of the work processes, visual deficits have been observed. The objective of the present study was to compare contrast sensitivity among former microelectronics assembly workers, with normal far and near visual acuity, and a reference group from the same region, with similar acuity. No significant differences were observed between scores at the two ends of the contrast sensitivity curves; however, at the intermediate spatial frequencies, the former microelectronics workers' scores were significantly lower (Student's t-test; p less than 0.05). For the microelectronics workers, no relation was observed between age and contrast sensitivity at any spatial frequency, whereas for the reference group, contrast sensitivity scores were progressively lower with age at spatial frequencies greater than or equal to 6.0 cpd (r2 = 0.15 at 6 cpd to r2 = 0.45 at 18.0 cpd), suggesting that for the former there is some form of interference with the expected contrast sensitivity loss with age. Lower contrast sensitivity scores in intermediate spatial frequencies, observed among the former microelectronics workers, possibly reflect neural alterations, which may have resulted from exposure to neurotoxic substances. These findings suggest the need for further studies on visual functions in microelectronics workers.