Koessler L, Maillard L, Benhadid A, Vignal J P, Felblinger J, Vespignani H, Braun M
INSERM U947, Nancy University, France.
Neuroimage. 2009 May 15;46(1):64-72. doi: 10.1016/j.neuroimage.2009.02.006. Epub 2009 Feb 20.
Several studies have described cranio-cerebral correlations in accordance with the 10-20 electrode placement system. These studies have made a significant contribution to human brain imaging techniques, such as near-infrared spectroscopy and trans-magnetic stimulation. With the recent development of high resolution EEG, an extension of the 10-20 system has been proposed. This new configuration, namely the 10-10 system, allows the placement of a high number (64-256) of EEG electrodes. Here, we describe the cranio-cerebral correlations with the 10-10 system. Thanks to the development of a new EEG-MRI sensor and an automated algorithm which enables the projection of electrode positions onto the cortical surface, we studied the cortical projections in 16 healthy subjects using the Talairach stereotactic system and estimated the variability of cortical projections in a statistical way. We found that the cortical projections of the 10-10 system could be estimated with a grand standard deviation of 4.6 mm in x, 7.1 mm in y and 7.8 mm in z. We demonstrated that the variability of projections is greatest in the central region and parietal lobe and least in the frontal and temporal lobes. Knowledge of cranio-cerebral correlations with the 10-10 system should enable to increase the precision of surface brain imaging and should help electrophysiological analyses, such as localization of superficial focal cortical generators.
多项研究已根据10-20电极放置系统描述了颅-脑相关性。这些研究对近红外光谱和经磁刺激等人类脑成像技术做出了重大贡献。随着高分辨率脑电图的最新发展,有人提出了10-20系统的扩展方案。这种新配置,即10-10系统,允许放置大量(64 - 256个)脑电图电极。在此,我们描述与10-10系统的颅-脑相关性。由于一种新的脑电图-磁共振成像传感器以及一种能将电极位置投影到皮质表面的自动算法的开发,我们使用Talairach立体定向系统研究了16名健康受试者的皮质投影,并以统计方式估计了皮质投影的变异性。我们发现,10-10系统的皮质投影在x方向上的总体标准差为4.6毫米,在y方向上为7.1毫米,在z方向上为7.8毫米。我们证明,投影的变异性在中央区域和顶叶最大,在额叶和颞叶最小。了解与10-10系统的颅-脑相关性应能提高表面脑成像的精度,并有助于电生理分析,如浅表局灶性皮质发生器的定位。