Smolik Marek, Jakóbik-Kolon Agata
Department of Inorganic Chemistry and Technology, Faculty of Chemistry, Silesian University of Technology, 44-100 Gliwice, B. Krzywoustego 6, Poland.
Anal Chem. 2009 Apr 1;81(7):2685-7. doi: 10.1021/ac802601d.
Inductively coupled plasma atomic emission spectrometry (ICP-AES) and inductively coupled plasma mass spectrometry (ICPMS) methods were applied to check the possibility of determination of hafnium in zirconium at a level lower than 100 ppm. A zirconium matrix of hafnium content lower than 10 ppm was obtained using a worked-out separation method exploiting ion exchange on Diphonix resin. Both methods give results in good agreement with each other as well as with those for certified reference material BCR-098 (Zircaloy-4). They were utilized in determination of Hf in the samples collected during separation of microamounts of hafnium from zirconium by the mentioned ion exchange. These results proved the earlier described method of separation on Diphonix resin to be effective even when the initial concentration of hafnium in zirconium decreases from 2.4% to 0.0082%.
采用电感耦合等离子体原子发射光谱法（ICP - AES）和电感耦合等离子体质谱法（ICPMS）来检验测定锆中低于100 ppm铪含量的可能性。利用在Diphonix树脂上进行离子交换的成熟分离方法，获得了铪含量低于10 ppm的锆基体。两种方法所得结果相互之间以及与认证参考物质BCR - 098（锆合金 - 4）的结果都吻合良好。它们被用于测定通过上述离子交换从锆中分离微量铪时所采集样品中的铪。这些结果证明，即使锆中铪的初始浓度从2.4%降至0.0082%，之前所描述的在Diphonix树脂上的分离方法仍然有效。
