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外延BaO/Si(001)界面的原子结构。

Atomic structure of the epitaxial BaO/Si(001) interface.

作者信息

Segal Y, Reiner J W, Kolpak A M, Zhang Z, Ismail-Beigi S, Ahn C H, Walker F J

机构信息

Department of Applied Physics and Center for Research on Interface Structures and Phenomena, Yale University, New Haven, Connecticut 06520-8284, USA.

出版信息

Phys Rev Lett. 2009 Mar 20;102(11):116101. doi: 10.1103/PhysRevLett.102.116101. Epub 2009 Mar 17.

Abstract

We present the structure of the interface responsible for epitaxy of crystalline oxides on silicon. Using synchrotron x-ray diffraction, we observe a 2 x 1 unit cell reconstruction at the interface of BaO grown on Si(001) terminated with 1/2 ML of Sr. Since this symmetry is not present in bulk BaO or Si, only the interface contributes to diffracted intensity. First principles calculations accurately predict the observed diffraction and identify the structure of the BaO/Si interface, including the elemental composition and a sub-A rumpling due to epitaxial strain of the 7 adjacent BaO and Si layers.

摘要

我们展示了负责在硅上外延生长晶体氧化物的界面结构。利用同步加速器X射线衍射,我们观察到在以1/2单层锶终止的Si(001)上生长的BaO界面处有一个2×1晶胞重构。由于这种对称性在块状BaO或Si中不存在,只有界面会对衍射强度有贡献。第一性原理计算准确地预测了观察到的衍射,并确定了BaO/Si界面的结构,包括元素组成以及由于相邻的7层BaO和Si层的外延应变导致的亚埃起伏。

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