Pires David, Gotsmann Bernd, Porro Fabrizio, Wiesmann Dorothea, Duerig Urs, Knoll Armin
IBM Zurich Research Laboratory, Saumerstrass 4, 8803 Ruschlikon, Switzerland.
Langmuir. 2009 May 5;25(9):5141-5. doi: 10.1021/la804191m.
The roughness of spin-cast polymer films arises from thermally activated capillary waves during preparation and typically amounts to about 0.5 nm(rms) measured on a micrometer-sized surface area. Templating from atomically flat mica substrates allows the creation of polymer films with a surface roughness approaching the molecular scale. Three regimes of spatial frequencies are identified in which the roughness is controlled by different physical mechanisms. We find that frozen-in elastic pressure waves ultimately limit the flatness of polymer films.
旋铸聚合物薄膜的粗糙度源于制备过程中的热激活毛细波,在微米级表面积上测量时,其均方根粗糙度通常约为0.5纳米。以原子级平整的云母衬底为模板,可以制备出表面粗糙度接近分子尺度的聚合物薄膜。我们确定了三种空间频率区域,其中粗糙度由不同的物理机制控制。我们发现,冻结的弹性压力波最终限制了聚合物薄膜的平整度。