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有毒药物呋喃妥因的溶出伏安行为

Stripping voltammetric behaviour of toxic drug nitrofurantoin.

作者信息

Jain Rajeev, Dwivedi Ashish, Mishra Ritesh

机构信息

School of Studies in Chemistry, Jiwaji University, Gwalior 474011, India.

出版信息

J Hazard Mater. 2009 Sep 30;169(1-3):667-72. doi: 10.1016/j.jhazmat.2009.03.138. Epub 2009 Apr 7.

Abstract

A simple, sensitive and reproducible squarewave cathodic adsorptive stripping voltammetric method has been developed for the determination of nitrofurantoin in solubilized system. The objective of the present paper is to investigate the redox behaviour of nitrofurantoin by using different voltammetric techniques and to establish the methodology for its determination in the presence of surfactants. Voltammograms of the drug with cetrimide in phosphate buffers of pH 2-11 exhibited a single well-defined reduction peak which may be attributed to the reduction of -NO(2) group. The reduction process is irreversible over the entire pH range studied. The mechanism of reduction has been postulated on the basis of controlled potential electrolysis, coulometry and spectral analysis. The proposed SWCAdSV voltammetric method allows the determination of nitrofurantoin in linear concentration range 2 x 10(-5) to 1 x 10(-7) mol L(-1). The lower limit of detection (LOD) and lower limit of quantification (LOQ) are 0.06 and 0.27 ng/mL, respectively.

摘要

已开发出一种简单、灵敏且可重现的方波阴极吸附溶出伏安法,用于测定增溶体系中的呋喃妥因。本文的目的是通过使用不同的伏安技术研究呋喃妥因的氧化还原行为,并建立在表面活性剂存在下其测定方法。在pH 2 - 11的磷酸盐缓冲液中,药物与西曲溴铵的伏安图显示出一个单一的、明确的还原峰,这可能归因于-NO(2)基团的还原。在所研究的整个pH范围内,还原过程是不可逆的。基于控制电位电解、库仑法和光谱分析,推测了还原机理。所提出的方波阴极吸附溶出伏安法可测定浓度范围为2×10(-5)至1×10(-7) mol L(-1)的线性呋喃妥因。检测下限(LOD)和定量下限(LOQ)分别为0.06和0.27 ng/mL。

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