Mohanta Kallol, Pal Amlan J
Indian Association for the Cultivation of Science, Department of Solid State Physics, Jadavpur, Kolkata 700032, India.
Nanotechnology. 2009 May 6;20(18):185203. doi: 10.1088/0957-4484/20/18/185203. Epub 2009 Apr 14.
We form junctions between two ZnO nanoparticles of two different dopant concentrations. A monolayer of intrinsic (n-type) and a monolayer of Al-doped (n(+)-type) ZnO nanoparticles are deposited in sequence to form the junctions. The size of the nanoparticles (and hence their bandgap) has been varied. Such junctions on a doped Si electrode have been characterized with a scanning tunneling microscope (STM) tip as the other electrode. The junctions show rectifying current-voltage characteristics. Control experiments, such as (1) symmetric characteristics from the components of the junctions and (2) inverse rectification in a junction having the monolayers in reverse sequence, rule out any effect of interfaces in the observed rectification. The results show that rectification is higher in nanodiodes with high bandgap nanoparticles. The ideality factor of the nanodiodes has been calculated.
我们在两种不同掺杂浓度的两个氧化锌纳米颗粒之间形成结。依次沉积一层本征(n型)和一层铝掺杂(n(+)型)的氧化锌纳米颗粒以形成结。纳米颗粒的尺寸(以及它们的带隙)已经改变。在掺杂硅电极上的这种结已经用扫描隧道显微镜(STM)针尖作为另一个电极进行了表征。这些结呈现出整流电流 - 电压特性。对照实验,例如(1)结的组件的对称特性以及(2)具有反向顺序单层的结中的反向整流,排除了在观察到的整流中界面的任何影响。结果表明,具有高带隙纳米颗粒的纳米二极管中的整流更高。已经计算了纳米二极管的理想因子。