Evans-Lutterodt Kenneth, Ablett James, Stein Aaron, Kao Chi-Chang, Tennant Don, Klemens Fred, Taylor Ashley, Jacobsen Chris, Gammel Peter, Huggins Harold, Bogart Greg, Ustin Scott, Ocola Leo
Opt Express. 2003 Apr 21;11(8):919-26. doi: 10.1364/oe.11.000919.
Using micro-fabrication techniques, we have manufactured a single element kinoform lens in single-crystal silicon with an elliptical profile for 12.398 keV (1A) x-rays. By fabricating a lens that is optimized at fixed wavelengths, absorption in the lens material can be significantly reduced by removing 2_ phase-shifting regions. This permits short focal length devices to be fabricated with small radii of curvatures at the lens apex. This feature allows one to obtain a high demagnification of a finite synchrotron electron source size. The reduced absorption loss also enables optics with a larger aperture, and hence improved resolution for focusing and imaging applications. Our first trial of these lenses has resulted in a one micron line focus (fwhm) at the National Synchrotron Light Source X13B beamline.
利用微加工技术，我们在单晶硅中制造了一个具有椭圆形轮廓的单元素相息透镜，用于12.398 keV（1埃）的X射线。通过制造在固定波长下优化的透镜，去除2π相移区域可以显著降低透镜材料中的吸收。这使得能够制造出短焦距器件，其透镜顶点处的曲率半径较小。此特性使人们能够对有限尺寸的同步加速器电子源进行高倍率缩小。吸收损耗的降低还使得能够制造具有更大孔径的光学器件，从而提高聚焦和成像应用的分辨率。我们对这些透镜的首次试验在国家同步辐射光源X13B光束线产生了1微米的线聚焦（半高宽）。
