Wagai N, Tawara K
Developmental Research Laboratories, Daiichi Pharmaceutical Co., Ltd., Tokyo, Japan.
Toxicol Lett. 1991 Oct;58(2):215-23. doi: 10.1016/0378-4274(91)90176-7.
The phototoxic potentials of quinolone derivatives and the possibility of free radical contribution to their phototoxicity were investigated by measuring increments in ear thickness. Balb/c mice, fasted overnight, were orally administered ofloxacin (OFLX), lomefloxacin (LMFX), enoxacin (ENX), ciprofloxacin (CPFX) and DR-3355 (the s-isomer of OFLX), and immediately exposed to ultraviolet-A light (UVA: 320-400 nm) for 4 h (21.6 joules/cm2). Measurement of ear thickness was carried out 0, 24 and 48 h after the end of irradiation. The time-course profiles of ear thickness varied with both the doses and the quinolone used, but linear dose-response curves were obtained from the data 24 h after irradiation ended. The 50% ear thickness increment-inducing doses of LMFX, ENX, OFLX, CPFX and DR-3355 were calculated as 24.8, 81.9, 428.0, 457.9 and 526.6 mg/kg, respectively. The phototoxic potential of these quinolones coincided with the data obtained previously by measuring the incidence of erythema on the ears. Pretreatment with butylated hydroxtoluene, a free radical scavenger, almost completely prevented all swelling reactions induced by the quinolones. These results suggest that the degree of phototoxicity induced by the quinolones used could depend on the balance between the generation of free radicals and the effectiveness of the defense systems against toxic radicals.
通过测量耳厚度的增加,研究了喹诺酮衍生物的光毒性潜力以及自由基对其光毒性作用的可能性。将禁食过夜的Balb/c小鼠口服给予氧氟沙星(OFLX)、洛美沙星(LMFX)、依诺沙星(ENX)、环丙沙星(CPFX)和DR-3355(OFLX的s-异构体),并立即暴露于紫外线A光(UVA:320 - 400nm)下4小时(21.6焦耳/平方厘米)。在照射结束后的0、24和48小时测量耳厚度。耳厚度的时间进程曲线随所用剂量和喹诺酮的不同而变化,但从照射结束后24小时的数据获得了线性剂量反应曲线。LMFX、ENX、OFLX、CPFX和DR-3355诱导耳厚度增加50%的剂量分别计算为24.8、81.9、428.0、457.9和526.6毫克/千克。这些喹诺酮的光毒性潜力与先前通过测量耳部红斑发生率获得的数据一致。用自由基清除剂丁基化羟基甲苯预处理几乎完全阻止了喹诺酮诱导的所有肿胀反应。这些结果表明,所用喹诺酮诱导的光毒性程度可能取决于自由基的产生与针对有毒自由基的防御系统有效性之间的平衡。