Jeong Hoon Eui, Kwak Moon Kyu, Park Chan Ick, Suh Kahp Yang
School of Mechanical and Aerospace Engineering, Seoul National University, Seoul 151-742, South Korea.
J Colloid Interface Sci. 2009 Nov 1;339(1):202-7. doi: 10.1016/j.jcis.2009.07.020. Epub 2009 Jul 12.
Micro- and nanoscale combined hierarchical polymer structures were fabricated by UV-assisted capillary force lithography. The method is based on the sequential application of engraved polymer molds with a UV-curable resin of polyurethane acrylate (PUA) followed by surface treatment with a trichloro(1H,1H,2H,2H-perfluorooctyl) silane in vapor phase. Two distinct wetting states were observed on these dual-roughness structures. One is "Cassie-Wenzel state" where a water droplet forms heterogeneous contact with microstructures and homogeneous contact with nanostructures. The other is "Cassie-Cassie state" where a droplet makes heterogeneous contact both with micro- and nanostructures. A simple thermodynamic model was developed to explain static contact angle, hysteresis, and wetting transition on dual-roughness structures.
通过紫外辅助毛细力光刻技术制备了微米和纳米尺度相结合的分级聚合物结构。该方法基于依次使用刻有图案的聚合物模具和聚氨酯丙烯酸酯(PUA)紫外光固化树脂,随后在气相中用三氯(1H,1H,2H,2H-全氟辛基)硅烷进行表面处理。在这些具有双重粗糙度的结构上观察到两种不同的润湿状态。一种是“卡西-文策尔状态”,即水滴与微结构形成非均匀接触,与纳米结构形成均匀接触。另一种是“卡西-卡西状态”,即液滴与微结构和纳米结构均形成非均匀接触。建立了一个简单的热力学模型来解释双重粗糙度结构上的静态接触角、滞后现象和润湿转变。