Department of Electronic Science and Engineering, Kyoto University, Katsura A1-326, Nishikyo-ku, Kyoto 615-8510, Japan.
J Colloid Interface Sci. 2009 Nov 15;339(2):481-8. doi: 10.1016/j.jcis.2009.08.004. Epub 2009 Aug 9.
Poly(vinylidene fluoride) films between 60 and 120nm have been prepared with electrostatic spray deposition (ESD) in 25-45s. The films are robust and exhibit a strong adhesion to the substrate surface. The important electrospray parameters for ultra-thin film formation are droplet size, initial polymer concentration, shear rate at impact, and volume flux. The latter can be understood as a measure for the solvent balance between deposition and evaporation; it affects overall film quality. The droplet size determines the minimum film thickness at which continuous film forms without voids. Polymer concentration affects thin-film smoothness and below a fixed concentration threshold, films cease to appear. For the very first droplets, wetting behavior on the substrate is most important. Subsequently, shear rate determines how voids are filled up and it determines final film smoothness. In addition to the electrospray conditions, substrates that favor wetting and have a capability to conduct charges away from the surface contribute to the formation of well-defined, ultra-thin films.
已通过静电喷雾沉积(ESD)在 25-45 秒内制备了 60-120nm 的聚(偏二氟乙烯)薄膜。这些薄膜坚固耐用,与基底表面具有很强的附着力。形成超薄薄膜的重要电喷雾参数是液滴大小、初始聚合物浓度、撞击时的剪切速率和体积通量。后一个参数可以理解为沉积和蒸发之间溶剂平衡的度量;它会影响整体薄膜质量。液滴大小决定了形成无空隙的连续薄膜的最小薄膜厚度。聚合物浓度会影响薄膜的平整度,低于固定的浓度阈值,薄膜就会消失。对于最初的液滴,在基底上的润湿行为最为重要。随后,剪切速率决定了如何填补空隙,它决定了最终薄膜的平整度。除了电喷雾条件外,有利于润湿且能够将电荷从表面带走的基底有助于形成定义明确的超薄薄膜。