Zhang Can, Ding Wanyu, Wang Hualin, Chai Weiping, Ju Dongying
Institute of Optoelectronic Materials and Device, Dalian Jiaotong University, Dalian, China.
J Environ Sci (China). 2009;21(6):741-4. doi: 10.1016/s1001-0742(08)62334-7.
TiO2 films were deposited at room temperature by DC pulse magnetron sputtering system. The crystalline structures, morphological features and photocatalytic activity of TiO2 films were systematically investigated by X-ray diffraction (XRD), atomic force microscopy (AFM) and ultraviolet spectrophotometer, respectively. The results indicated that working pressure was the key deposition parameter influencing the TiO2 film phase composition at room temperature, which directly affected its photocatalytic activity. With increasing working pressure, the target self-bias decreases monotonously. Therefore, low temperature TiO2 phase (anatase) could be deposited with high working pressure. The anatase TiO2 films deposited with 1.4 Pa working pressure displayed the highest photocatalytic activity by the decomposition of Methyl Orange solution, which the degradation rate reached the maximum (35%) after irradiation by ultraviolet light for 1 h.
采用直流脉冲磁控溅射系统在室温下沉积TiO₂薄膜。分别通过X射线衍射（XRD）、原子力显微镜（AFM）和紫外分光光度计对TiO₂薄膜的晶体结构、形貌特征和光催化活性进行了系统研究。结果表明，工作压力是影响室温下TiO₂薄膜相组成的关键沉积参数，直接影响其光催化活性。随着工作压力的增加，靶材自偏压单调下降。因此，在高工作压力下可以沉积低温TiO₂相（锐钛矿）。在1.4 Pa工作压力下沉积的锐钛矿TiO₂薄膜对甲基橙溶液的分解表现出最高的光催化活性，在紫外光照射1 h后降解率达到最大值（35%）。
