Liu Honglin, Yao Tingting, Ding Wanyu, Wang Hualin, Ju Dongying, Chai Weiping
School of Materials Science and Engineering, Dalian Jiaotong University, Dalian 116028, China.
School of Materials Science and Engineering, Dalian Jiaotong University, Dalian 116028, China; Liaoning Province Education Department Engineering Research Center of Optoelectronic Materials and Device, Dalian 116028, China; Key Laboratory of Materials Modification by Laser, Ion and Electron Beams, Dalian University of Technology, Ministry of Education, Dalian 116028, China.
J Environ Sci (China). 2013 Dec;25 Suppl 1:S54-8. doi: 10.1016/S1001-0742(14)60626-4.
N doped TiO2 films were deposited by direct current pulse magnetron sputtering system at room temperature. By using UV-Vis spectrophotometer and atomic force microscope, we studied the influence of N2 flow rate on the optical property and surface morphology of films. The results indicate that the optical property and surface morphology of N doped TiO2 film was dominated by the N2 flow rate. The mean absorbency in visible range of pure TiO2 films is near to 0%, which means that the pure TiO2 could hardly display the photocatalytic property in visible range. When N2 flow rate is 2 sccm, the mean absorbency in visible range of N doped TiO2 film could reach at 24%. In this case, the film could be used as photocatalyst induced by visible light. While with increasing N2 flow rate, the mean absorbency in visible range of N doped TiO2 film decreased abruptly. Especially when N2 flow rate exceeded 8 sccm, the mean absorbency in visible range of N doped TiO2 film decreased to about 0%, which is like pure TiO2 fimls.
通过直流脉冲磁控溅射系统在室温下沉积氮掺杂二氧化钛薄膜。利用紫外可见分光光度计和原子力显微镜，研究了氮气流量对薄膜光学性能和表面形貌的影响。结果表明，氮掺杂二氧化钛薄膜的光学性能和表面形貌受氮气流量的主导。纯二氧化钛薄膜在可见光范围内的平均吸光度接近0%，这意味着纯二氧化钛在可见光范围内几乎不显示光催化性能。当氮气流量为2 sccm时，氮掺杂二氧化钛薄膜在可见光范围内的平均吸光度可达24%。在这种情况下，该薄膜可作为可见光诱导的光催化剂。而随着氮气流量的增加，氮掺杂二氧化钛薄膜在可见光范围内的平均吸光度急剧下降。特别是当氮气流量超过8 sccm时，氮掺杂二氧化钛薄膜在可见光范围内的平均吸光度降至约0%，这与纯二氧化钛薄膜相似。
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