Stevenson R M, Norman M J, Bett T H, Pepler D A, Danson C N, Ross I N
Opt Lett. 1994 Mar 15;19(6):363-5. doi: 10.1364/ol.19.000363.
The generation of uniform focal intensity profiles is important for a number of applications, including laser-plasma interaction experiments. We report on a focusing system that uses a novel binary-phase optic capable of producing efficient two-dimensional uniform top-hat intensity optical and x-ray profiles.
产生均匀的焦斑强度分布对于包括激光-等离子体相互作用实验在内的许多应用来说都很重要。我们报道了一种聚焦系统，该系统使用一种新型二元相位光学元件，能够产生高效的二维均匀平顶强度光学和X射线分布。
