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二苯甲酰甲烷的光降解:防晒霜光接触过敏的潜在原因。

Photodegradation of dibenzoylmethanes: potential cause of photocontact allergy to sunscreens.

机构信息

Dermatochemistry and Skin Allergy, Department of Chemistry, University of Gothenburg, SE-412 96 Gothenburg, Sweden.

出版信息

Chem Res Toxicol. 2009 Nov;22(11):1881-92. doi: 10.1021/tx900284e.

Abstract

One of the most frequently observed photoallergens today is the sunscreen agent 4-tert-butyl-4'-methoxy dibenzoylmethane (1a). The structurally similar compound, 4-isopropyldibenzoylmethane (1b), was a common cause of sunscreen allergy in the eighties and early nineties but was removed from the market in 1993 and replaced with dibenzoylmethane 1a. We have studied the photodegradation of the dibenzoylmethane 1a, to better understand how these substances cause an immune reaction. Several expected degradation products were formed and identified. Of these, arylglyoxals and benzils were of particular interest because they were unexplored as potential contact allergens. The allergenic potential of photodegraded 1a was evaluated by screening the formed arylglyoxals and benzils for their sensitizing capacity in the murine local lymph node assay. The arylglyoxals were found to be strong sensitizers. They were also found to be highly reactive toward the nucleophile arginine, which indicates that the immunogenic hapten-protein complex could be formed via an electrophilic-nucleophilic pathway. By varying the electron-withdrawing or -donating capacity of the substituent in the para position of the arylglyoxal, the electronic effects were shown to have no significant impact on either the sensitizing or the electrophilic power of arylglyoxals. Thus, a change in the substitution pattern of the parent dibenzoylmethane will not influence the sensitizing capacity of the products formed from them upon photodegradation. Furthermore, the combined studies of benzils, using the local lymph node assay and a cell proliferation assay, indicate that the benzils are cytotoxic rather than allergenic. Taken together, this study presents strong indication that photocontact allergy to dibenzoylmethanes is caused by the arylglyoxals that are formed upon photodegradation.

摘要

如今,最常被观察到的光变应原之一是防晒霜成分 4-叔丁基-4'-甲氧基二苯甲酰基甲烷(1a)。结构相似的化合物 4-异丙基二苯甲酰基甲烷(1b)在 80 年代和 90 年代初是常见的防晒霜过敏原因,但于 1993 年从市场上撤出,被二苯甲酰基甲烷 1a 所取代。我们研究了二苯甲酰基甲烷 1a 的光降解,以更好地了解这些物质如何引起免疫反应。形成并鉴定了几种预期的降解产物。其中,芳基乙二醛和二苯甲酮特别有趣,因为它们作为潜在的接触过敏原尚未被探索。通过筛选形成的芳基乙二醛和二苯甲酮在小鼠局部淋巴结测定中评估光降解 1a 的致敏潜力。芳基乙二醛被发现是强致敏剂。它们也被发现对亲核试剂精氨酸具有高反应性,这表明免疫原性半抗原-蛋白质复合物可以通过亲电-亲核途径形成。通过改变芳基乙二醛对位取代基的吸电子或供电子能力,表明电子效应对芳基乙二醛的致敏能力或亲电能力没有显著影响。因此,母体二苯甲酰基甲烷的取代模式的变化不会影响其光降解产物的致敏能力。此外,使用局部淋巴结测定和细胞增殖测定对二苯甲酮的联合研究表明,二苯甲酮是细胞毒性的,而不是变应原性的。总之,这项研究强烈表明,二苯甲酰基甲烷的光接触过敏是由光降解形成的芳基乙二醛引起的。

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