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氧化石墨烯作为储氢的理想基底。

Graphene oxide as an ideal substrate for hydrogen storage.

机构信息

Laboratory of Materials Modification by Laser, Electron, and Ion Beams, School of Physics and Optoelectronic Technology and College of Advanced Science and Technology, Dalian University of Technology, Dalian 116024, China.

出版信息

ACS Nano. 2009 Oct 27;3(10):2995-3000. doi: 10.1021/nn900667s.

DOI:10.1021/nn900667s
PMID:19856979
Abstract

Organometallic nanomaterials hold the promise for molecular hydrogen (H(2)) storage by providing nearly ideal binding strength to H(2) for room-temperature applications. Synthesizing such materials, however, faces severe setbacks due to the problem of metal clustering. Inspired by a recent experimental breakthrough ( J. Am. Chem. Soc. 2008 , 130 , 6992 ), which demonstrates enhanced H(2) binding in Ti-grafted mesoporous silica, we propose combining the graphene oxide (GO) technique with Ti anchoring to overcome the current synthesis bottleneck for practical storage materials. Similar to silica, GO contains ample hydroxyl groups, which are the active sites for anchoring Ti atoms. GO can be routinely synthesized and is much lighter than silica. Hence, higher gravimetric storage capacity can be readily achieved. Our first-principles computations suggest that GO is primarily made of low-energy oxygen-containing structural motifs on the graphene sheet. The Ti atoms bind strongly to the oxygen sites with binding energies as high as 450 kJ/mol. This is comparable to that of silica and is indeed enough to prevent the Ti atoms from clustering. Each Ti can bind multiple H(2) with the desired binding energies (14-41 kJ/mol-H(2)). The estimated theoretical gravimetric and volumetric densities are 4.9 wt % and 64 g/L, respectively.

摘要

金属有机纳米材料有望通过为室温应用提供几乎理想的 H(2)结合强度来实现分子 H(2)的储存。然而,由于金属团聚的问题,合成这种材料面临着严重的挫折。受最近一项实验突破的启发(J. Am. Chem. Soc. 2008, 130, 6992),该实验证明了 Ti 接枝介孔硅中增强的 H(2)结合,我们提出将氧化石墨烯(GO)技术与 Ti 锚定相结合,以克服当前实际存储材料合成的瓶颈。与二氧化硅类似,GO 含有丰富的羟基,是锚定 Ti 原子的活性位点。GO 可以常规合成,并且比二氧化硅轻得多。因此,可以轻松实现更高的重量存储容量。我们的第一性原理计算表明,GO 主要由石墨烯片上的低能含氧结构基元组成。Ti 原子与氧位强烈结合,结合能高达 450 kJ/mol。这与二氧化硅相当,足以防止 Ti 原子聚集。每个 Ti 可以与所需的结合能(14-41 kJ/mol-H(2))结合多个 H(2)。估计的理论重量和体积密度分别为 4.9wt%和 64 g/L。

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