Advanced Materials Laboratories, Sony Corporation, Okata, Atsugi, Kanagawa 243-0021, Japan.
Phys Rev Lett. 2009 Oct 2;103(14):146102. doi: 10.1103/PhysRevLett.103.146102.
We have observed, by high-resolution cross-sectional transmission electron microscopy, the first direct evidence of polymorphic transformation in pentacene thin films deposited on silicon oxide substrates. Polymorphic transformation from the thin-film phase to the bulk phase occurred preferentially near polycrystalline grain boundaries, which exhibit concave surfaces. This process is thought to be driven by compressive stress caused by the grain boundaries. In addition to this stress, lattice mismatch between the two phases also results in structural defect formation.
我们通过高分辨率的横截面透射电子显微镜观察到,在沉积在氧化硅衬底上的五苯薄膜中,首次直接观察到了多晶型转变的证据。多晶型转变优先在多晶界附近的薄膜相中发生,这些晶界表现出凹面。这一过程被认为是由晶界引起的压缩应力驱动的。除了这种应力之外,两相之间的晶格失配也导致了结构缺陷的形成。