Park Y K, Umar Ahmad, Lee E W, Hong D M, Hahn Yoon-Bong
School of Semiconductor and Chemical Engineering, BK 21 Centre for Future Energy Materials and Devices and Nanomaterials Processing Research Centre, Chonbuk National University, Jeonju 561-756, South Korea.
J Nanosci Nanotechnol. 2009 Oct;9(10):5745-51. doi: 10.1166/jnn.2009.1247.
Electrical properties of single ZnO nanobelt have been examined by fabricating single nanobelt based field effect transistors (FETs). The ZnO nanobelts were grown via non-catalytic simple thermal evaporation process by using metallic zinc powder in the presence of oxygen. The detailed structural and optical characterizations confirmed that the grown nanobelts are well-crystalline with the wurtzite hexagonal phase and exhibiting good optical properties. The passivation effect on the electrical characteristics of the as-grown nanobelts was also evaluated by passivating the fabricated FETs with polymethyl methacrylate (PMMA). The passivated single ZnO nanobelt based FETs exhibited higher electrical performance as compared to non-passivated FETs due to reduction in the physically absorbed chemisorbed species such as O-, O2-, O2, or OH- etc. The field effect mobility (micro(eff)) of the fabricated nanobelt based non-passivated and passivated FETs was estimated to be approximately 21.3 and 59 cm2/V x s, respectively. Moreover the carrier concentration and peak transconductance of the fabricated non-passivated and passivated FET were calculated to be approximately 8.73 x 10(17) and approximately 1.86 x 10(18) cm(-3) and approximately 0.76 and 1.4 microS, respectively. This work offers substantial opportunities for further practical electronics and photonics nanodevice applications of ZnO based nanostructures.
通过制备基于单个纳米带的场效应晶体管(FET),研究了单个ZnO纳米带的电学性质。ZnO纳米带是在氧气存在的情况下,通过使用金属锌粉经非催化简单热蒸发工艺生长而成。详细的结构和光学表征证实,生长的纳米带具有纤锌矿六方相,结晶良好,并表现出良好的光学性质。还通过用聚甲基丙烯酸甲酯(PMMA)对制备的FET进行钝化,评估了钝化对生长态纳米带电学特性的影响。与未钝化的FET相比,基于单个ZnO纳米带的钝化FET表现出更高的电学性能,这是由于诸如O-、O2-、O2或OH-等物理吸附的化学吸附物种减少。制备的基于纳米带的未钝化和钝化FET的场效应迁移率(μeff)估计分别约为21.3和59 cm2/V·s。此外,制备的未钝化和钝化FET的载流子浓度和峰值跨导分别计算为约8.73×1017和约1.86×1018 cm-3以及约0.76和1.4 μS。这项工作为基于ZnO的纳米结构在进一步的实际电子和光子纳米器件应用中提供了大量机会。